The STP-XA2703C turbo pump offers high performance in the process range of high vacuum to 2300 sccm process flow with enhanced throughput for all gases.
This pump is based on a new platform design offering features to improve thermal management, which enhances performance on harsh processes, increases the maximum process flow capability and reduces the effects of corrosion and deposition.
The outstanding performance is suited to both light and harsh applications, such as semiconductor etch, implant, lithography and LCD processes.