Two GE Analytical Instruments’ on-line TOC analyzers – the Sievers 500 RL and the Sievers 500 Rle - were designed for pharmaceutical and microelectronics applications.
For pharmaceutical applications, the Sievers 500 RL On-Line TOC Analyzer delivers the accuracy, automation, and confidence needed to transition from laboratory to on-line TOC for enhanced operating efficiencies and science-based risk management. Using the proven Sievers laboratory TOC measurement technology, the Sievers 500 RL provides continuous quality assurance for on-line pharmaceutical water release, cleaning validation, and Process Analytical Technology (PAT) quality initiatives
The reagentless 500 RL features the revolutionary four-port Super iOS standards introduction device that fully automates system protocols, and transfers critical standards information directly to the Analyzer for secure data management, significantly reducing costs and risks.
The 500 RL Analyzer offers 12-month calibration stability, a color touch-screen display, USB port, and minimal maintenance (a few hours per year). With a wide operating range of 0.03 ppb to 2,500 ppb, the 500 RL also measures USP <645> conductivity.
For the microelectronics industry, the Sievers 500 Rle accurately detects problematic compounds such as urea, trimethylamine, organic acids and bases in ultra low-level waters. The 500 RLe can be placed throughout the UPW process system and in the polish loop.
The reagentless Sievers 500 RLe monitors TOC in waters ranging from 0.03 ppb to 2.5 ppm with conductivity up to 25 µS/cm. It uses GE Analytical Instruments’ patented membrane-conductometric technology, delivering ultra low-level accuracy and reliability by eliminating false positive and false negative readings associated with other simplified TOC technologies. As demonstrated in published studies, the Sievers 500 RLe is the only TOC analyzer to detect problematic organic compounds that present significant risk to fab operations.
Additionally, the 500 RLe is the only analyzer designed specifically to work in low dissolved oxygen (DO) and hydrogenated water systems, both of which are becoming more common in microelectronics applications. Low DO systems lack sufficient oxygen to facilitate full oxidation, resulting in artificially low TOC results.
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